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  • plasma enhanced chemical vapor deposition (PECVD) tube furnace system

plasma enhanced chemical vapor deposition (PECVD) tube furnace system

简要描述:...

  • 产品型号:
  • 设备别称:
  • 设计温度:
  • 设备类型:真空炉
详细介绍
真空炉
生产厂家洛阳实验电炉 设计温度
炉腔规格 真空炉 可选结构 立式、卧式、井式、升降式
应用领域实验室、化验室、热处理车间等 参考价格联系客服

Split Tube furnace

1

1200oC Max. working temperature for < 60 minutes

2

1100oC Max for continuous heating

3

30 segments programmable precision digital temperature controller

4

440 mm length single heating zone and 150 mm length constant temperate zone

5

High purity quartz tube optional from ( click optional bar to choose )

6

3.14"OD x 2.83"ID x 48'' Length

7

One pair of vacuum sealed flange with valves

8

Input power: 208 – 240V AC input, single phase at max. 4KW

9

Plasma RF Power supply

1

Output Power: 5 -500W adjustable with ± 1% stability

2

RF frequency: 13.56 MHz ±0.005% stability

3

Reflection Power: 200W max.

4

Matching: Automatic

5

RF Output Port: 50 Ω, N-type, female

6

Noise: <50 dB.

7

Cooling: Air cooling.

8

Power : 208-240VAC, 50/60Hz

9

Note: This RF power supply can accept 50 - 80 mm Max. quartz tube

by changing flange

10

Anti-corrosive

Pressure Gauge

1

3.8x10-5 to 1125 Torr measurement range

2

Anti-corrosive, gas-type independent

3

High accuracy and reproducibility at atmosphere for reliable atmospheric

pressure detection

4

Fast atmospheric detection eliminates waiting time and shortens process cycle

5

Easy to exchange plug & play sensor element

6

Vacuum Pump

and valve

1

Heavy Duty Rotary Vane Vacuum Pump (7.8 CFM -240 L/m) with Two Stage Exhaust

System installed in bottom case with max. vacuum pressure 10-2 torr.

2

KFD25 adapter and stainless steel pipe are connected between pump and tube

flange with precision ball valve

3

Digital vacuum pressure gauge and display are installed with the furnace

4

4

Mass Flow meters

1

Four precision mass flow meters (0.02% accuracy) with digital display are installed on

the bottom case to control

gas flow rate automatically.

2

MFC 1: Gas flow range from 0~100 sccm

3

MFC 2&3: Control range from 0~200 sccm

4

MFC 4: Control range from 0~500 sccm

5

One gas mixing tank is installed on bottom case with liquid release valve

6

4 stainless steel needle valves is installed on left side of bottom case to

control 4type gases mixing manually

7

Gas inlet fitting: four 1/4NPS

8

Gas outlet fitting: four 1/4NPS

9



plasma enhanced chemical vapor deposition (PECVD) tube furnace system是由厂家洛阳实验电炉生产的℃。

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